Key Metrics
CiteScore 

6.7
Impact Factor 

< 5
Scite Index 

0.94 5-Year SI

SJR 

Q1Mechanical Engineering

SNIP 

1.06
Recommended pre-submission checks
Powered by 

Topics Covered on Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing Journal Specifications
Indexed in the following public directories
Web of Science
Scopus
Inspec
SJR
| Overview | |
| Publisher | ELSEVIER SCI LTD |
| Language | English |
| Frequency | Monthly |
| General Details | |
| Language | English |
| Frequency | Monthly |
| Publication Start Year | 1998 |
| Publisher URL | Visit website |
| Website URL | Visit website |
View less
Planning to publish in Materials Science in Semiconductor Processing ?
Upload your Manuscript to get
- Degree of match
- Common matching concepts
- Additional journal recommendations

Recently Published Papers in Materials Science in Semiconductor Processing
Advances on the application of ceria nanoparticles in dielectric layer CMP and post-cleaning: structural control, modification strategies, and mechanistic studies
- 1 Sep 2026
- Materials Science in Semiconductor Processing
Interfacial ion dynamics and synaptic behavior in Ag/MoS2/TiO2 heterostructure memristor for neuromorphic applications
- 1 Sep 2026
- Materials Science in Semiconductor Processing
VGF–VB stage switched growth process for 4.5 inch InP single crystals with low dislocation density and high uniformity
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Highly sensitive photoelectrochemical aptasensor based on Bi2S3/CdS/TiO2NRA nanorod arrays for alpha-fetoprotein detection
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Modeling of substrate impacts on formation of bilayer silicene
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Preparation and optoelectronic properties of large area GaN crystalline films by MPCVD
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Advances on the application of ceria nanoparticles in dielectric layer CMP and post-cleaning: structural control, modification strategies, and mechanistic studies
- 1 Sep 2026
- Materials Science in Semiconductor Processing
Interfacial ion dynamics and synaptic behavior in Ag/MoS2/TiO2 heterostructure memristor for neuromorphic applications
- 1 Sep 2026
- Materials Science in Semiconductor Processing
VGF–VB stage switched growth process for 4.5 inch InP single crystals with low dislocation density and high uniformity
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Highly sensitive photoelectrochemical aptasensor based on Bi2S3/CdS/TiO2NRA nanorod arrays for alpha-fetoprotein detection
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Modeling of substrate impacts on formation of bilayer silicene
- 1 Aug 2026
- Materials Science in Semiconductor Processing
Preparation and optoelectronic properties of large area GaN crystalline films by MPCVD
- 1 Aug 2026
- Materials Science in Semiconductor Processing